Mo doping WO3 large area electrochromic glass is a new solution for modern building energy saving. Wherein, Mo-doped tungsten oxide electrochromic thin film, as an important electrochromic layer material for assembling electrochromic window, can be prepared by a magnetron sputtering method. The specific sputtering steps are as follows:
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The cleaned FTO conductive glass was placed on a tray with the conductive surface facing up and fixed with 3M tape. The tray carrying the FTO conductive glass was placed in a vacuum reaction chamber along with the target, and then sputtering was started. First, the sputtering chamber is evacuated in an atmospheric state to bring the vacuum in the sputtering chamber to 10^-1 Pa. The gas is filled into the sputtering chamber, Ar2 is a working gas, O2 is used as a reaction gas, and the amount of intake air is adjusted to a desired value by a gas flow adjustment knob. It was pre-sputtered with pure argon for 10 min to remove contaminants from the surface of the target, and the sputtering was started after the pre-sputtering. A tungsten oxide electrochromic film was prepared by direct current sputtering. Wherein, the parameters of the sputtering process are shown as below: The sputtering target is a Mo-doped tungsten oxide target; the substrate is FTO conductive glass; the working gas is Ar2; the Ar2 gas flow is 70 sccm; the reaction gas is O2; the O2 gas flow is 1-4 sccm; substrate temperature is room temperature; sputtering gas pressure is 2.4 Pa; sputtering power is 60 W; sputtering time is 0.5 h; working voltage is 300 V; working current is 0.2 A.
